About thin film coating

Thin film coating and vacuum coating processes use vacuum technology to create a sub-atmospheric pressure environment and an atomic or molecular condensable vapor source to deposit thin films and coatings. The vapor source may be from a solid or liquid surface (physical vapor deposition – PVD), or from a chemical vapor precursor (chemical vapor deposition – CVD).

Temescal systems are used for coating wafers with thin layers of metal for compound semiconductor manufacturing and other precision metalization applications.

Ferrotec Electron Beam Evaporation guns are used for coating lens and other materials with thin layers of metal.

Ferrofluidic seals are used in many thin film coating solutions because these manufacturing processes are performed in a vacuum.

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