Chromium

Chromium Sputtering Targets

Able Target Ltd specializes in producing high purity Chromium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, photovoltaic, and coating applicationsby chemical vapor deposition (CVD) and physical vapor deposition (PVD) and optical applications. Our standard Chromium Sputtering Targets for large area thin film deposition are produced either by spray coating on a tubular substrate or casting of a solid tube.Rotary targets are available with dimensions and configurations up to 1,000 mm in length for large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys.

“Sputtering” allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment.

 Besides rotary targets we can also provide targets outside in just about any size and shape, such as rectangular, annular, or oval targets. Materials are produced using crystallization , solid state and other ultra high purification processes such as sublimation. Able Target specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Able Target also casts any of Chromium Sputtering Targets and most other advanced materials into rod, bar or plate form , as well as other machined shapes and through other processes nanoparticles .

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