Erbium

Erbium Sputtering Target

 

Able Target Limited specializes in producing high purity Erbium Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

We provide high purity metal, metal alloy and ceramic sputtering targets in more than 500 compositions. Quality is assured by our end-to-end quality control process, from powder synthesis, through densification, machining, bonding and full characterization.

 

Purity 99.9%, 99.95%, 99.99%
Shape Discs, Blocks, Tubes, Sheets, Rings, Rods, User specified
Size Circular: Diameter <250mm, Thickness >1mm; Block: Length <600mm, Width <250mm, Thickness >1mm

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