Nickel

Nickel Sputtering Target

 

Able Target specializes in producing high purity Nickel Sputtering TargetĀ  with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Many years of experience in manufacturing metal and alloy products allow Able TargetĀ to meet our customers increasing requirements with respect to purity, grain structure, density and target geometry. We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies.

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