sputtering target for LCD

sputtering target for LCD

In recent years the size of sputtering equipment has increased along with the increasing sizes of mother glass. Able Target provides high performance sputtering targets for these large sizes. In particular, ITO target, transparent dielectric material, with low particle and ultra-high density has been developed and provides high productivity.

 

Ni,NiCr,Al,AlTi,TiB,Ta,NiMn,FeNi,PtMn,Al2O3,AlTi,CoCrPt,CoCrPtB,Si,C,GeAsTe,,Bi,AgInAsTe,MoSix,Cr,TaB,TaGe,Si,SiO2
Ti (TiO2),Al (Al2O3),SUS,Ta,Ag,ZnO,ITO,ZnO-Al2O3,

  • Fine crystal particle, splash-free, large Al target
  • Large, monolithic Mo target
  • Development of high purity (4N or greater), large, monolithic Cr target
  • Development of Ultra-high density ITO target for transparent dielectric layer (density of 99.5% or greater is guaranteed)

 

 

 

 

 

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