Sputtering Target Maintenance

Sputtering Target Maintenance

Ramp Rates

Power should be ramped up SLOWLY to avoid arcing. Typical ramp rates for oxides are 10 watts p/hour p/square inch of target surface. A reasonable ramp rate for non-refractory metal targets is 50 watts p/hour p/square inch of surface area.

We recommend a VERY CONSERVATIVE break-in for oxide targets. We typically ramp an oxide target, like ITO to 2.0 watts/cm² DC for at least one hour.

After the long hold, we then ramp at 2.0 watts/cm² per half-hour to the recommended maximum operating power density of 9.5 watts/cm².

We also recommend a maximum operating power density for metal targets of 22 watt/cm² of surface area. This number is very dependent upon the cooling efficiency of your sputtering system.

Refer to your systems Operation Manual for recommended chamber pressure settings during deposition

Able Target Limited

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