sputtering target news

 

Sputtering targets are used to produce thin films of metals or compounds for many industries or daily applications.

A source material is bombarded with plasma ions that dislodge atoms from the surface of the target. The ejected atoms then deposit atop a substrate to form a thin film coating that is several atomic layers thickness.

The flat panel display industry, as well as all other thin film coating industries, requires a material which is conductive and transparent. Indium, when sputtered or evaporated, exhibits such properties and is an excellent material for meeting those requirements. Able Target Ltd can provide Indium and Indium/Tin products in both a sputtering target form or as an evaporation source.

Another requirement of the targeting industry is the ability to bond a target material to a backing plate prior to the sputtering process. Indium’s unique properties lend itself to be an excellent bonding glue for this application. Able Target Ltd offers pure Indium in bar form for your convenience.

Click here for additional information on our ITO Sputtering Targets.

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