TiAl

Able Target  produce TiAl sputtering targets with the rario of at% and wt%.

Name  TiAl alloy (Titanium/Aluminum)sputtering target

Ratio of each content:  50/50at%,50/50 wt%,33/67 at% etc.

Processing :  HIP,Smelting

AbleTarget Limited provides all kinds of sputtering targets,high purity and density targets,rotatable Targets,alloy targets,pure metal targets and other sputtering coating materials,thin film materials,PVD and CVD coatings and products,now becoming a perfect sputtering targets supplier around the world.

 

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